Sir, I have to design a structure with SOI as substrate and Si layer over it with air holes etched.my aim is to achieve slow light .
I am having trouble understanding the output of the extension code .I tried running the code according to my ctl file please guide as I am getting confusing(-ve group index values) results. Also guide regarding how to make calculations at some specific wavelength .suppose I want to make calculations of group index,group velocity ,dispersion and all other parameters at wavelength of 1.55 µm how can I do it.if you have any code regarding line-defect for slow light please provide it to me. if you can respond to my mail I will be really grateful
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