This Thursday at Change Nicki Dell will be talking about participant
response bias in ICTD and HCI.

Although HCI researchers and practitioners frequently work with groups of
people that differ significantly from themselves, little attention has been
paid to the effects these differences have on the evaluation of
technological systems. Via 450 interviews in Bangalore, India, we measure
participant response bias due to interviewer demand characteristics and the
role of social and demographic factors in influencing that bias. We find
that respondents are about 2.5x more likely to prefer a technological
artifact they believe to be developed by the interviewer, even when the
alternative is identical. When the interviewer is a foreign researcher
requiring a translator, the bias towards the interviewer's artifact
increases to 5x. In fact, the interviewer's artifact is preferred even when
it is degraded to be obviously inferior to the alternative. We conclude
that participant response bias should receive more attention within the CHI
community, especially when designing for underprivileged populations.

Nicki Dell is a PhD student in the Department of Computer Science and
Engineering at the University of Washington in Seattle. She is advised by
Professor Gaetano Borriello and Professor Linda Shapiro and her research
interests are in computer vision and human-computer interaction, with a
focus on designing and evaluating applications that improve the lives of
underserved populations in low-income regions. This talk will present
research that was done during a summer internship with the Technology for
Emerging Markets Lab at Microsoft Research in Bangalore India. Nicki also
runs the Change Seminar, a group at the University of Washington exploring
how technology can improve the lives of underserved populations in
low-income regions and is actively involved in DUB, a multidisciplinary
group at UW that leads research in Human Computer Interaction and Design.

What: Nicki Dell on Participant Response Bias.

Where: The Allen Center, CSE 203.

When: Thursday, February 16 at 12 noon.
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