-------- Original Message -------- From: Zenaan Harkness <[email protected]> Apparently from: [email protected] To: [email protected] Subject: Re: Open Fabs Date: Wed, 29 Jul 2015 09:27:53 +0000
> On 7/29/15, [email protected] <[email protected]> > wrote: > > For CPunks what's needed is a DIY Electron Beam Litho apparatus. Its > > basically an electron microscope in reverse. For relatively simple chips it > > could be more than adequate as its possible eliminates the need and > > complexity, chemistry, etc. for masks and can perform most all process > > functions (doping, implantation, etc.) and attain feature sizes commensurate > > with current foundary tech. AFAIK, its possible to build from used > > e-microscopes though maintaining calibration and linarity is something best > > learned in a working environment at someone else's expense. :) One of the > > main shortcomings of EBL is its low production rate since all features must > > be developed by "writing" them, like an old stylevector display, on the > > substrate. > > Whereas with "photon lithography" (terminology?) a light source covers > an area (of the mask?) which is then lens-focused down to the > appropriate scale (eg 24nm) onto the silicon and etc physical layer? > Firstly is this minimal understanding correct? > > Secondly is there any potential areal electron emission device (as > opposed to point electron emission device) comparable to current litho > tech (areal photon emission)? There was research and patenting in this area beginning in the 60-70s but I not seen any articles showing use.
