The lineal scale that is used for parametric masking is, I find, rather restricting when I am making adjustment, particularly at the low end of the scale. Would it not be more in keeping with other scales in general to use a log scale for this function?
Does anybody share this view or is there a very good reason for using the present scale? David ____________________________________________________________________________ darktable user mailing list to unsubscribe send a mail to [email protected]
