On Thu, Nov 16, 2006 at 12:02:22AM -0000, peter green wrote: > 2: the aptitude part also seems to have been copied straight from the sarge > notes, is it still relavent
aptitude in etch is _much_ better at conflict resolution than the one in sarge. (However, sometimes the upgrades get too big for it and the algorithms start running in exponential time; I'm not sure if we can do anything useful with this except document it and ask the user to fix some issues manually; even though aptitude offers to abort by itself after a certain amount of time, this can be confusing to users.) /* Steinar */ -- Homepage: http://www.sesse.net/ -- To UNSUBSCRIBE, email to [EMAIL PROTECTED] with a subject of "unsubscribe". Trouble? Contact [EMAIL PROTECTED]
