Electric has only design rules from MOSIS right?

No, Electric has design rules for more than just MOSIS.

You can have a look at:

http://www.staticfreesoft.com/jmanual/mchap07-04-02.html

The use of MOSIS with SCMOS design rules is probably most common. However, as it describes in section 7-4-2 of the Electric manual, you can also select the submicron or deep rules.

You can also see:

http://www.staticfreesoft.com/jmanual/mchap07-01-01.html

As you can see in the section 7-1-1 of the Electric manual, there are other technologies, like cmos, with different design rules.

In MOSIS design rules lambda is minimum of 0.09 for TSMC 180nm process.

1) So my question is can we design a layout with lamda=0.09 or 90nm for TSMC 0.18nm process in electric tool ?

I think layouts for the TSMC 180 nm process technology have been done before with Electric. It is probably why when you click Help->About Electric, then click Plugins that you should see "Missing: Technologies (cmos90, tsmc180)". However, I suspect that the TSMC technology is proprietary, such that the plugin cannot be found on the internet. I'm not sure where to get the plugin, maybe from TSMC or Dr. Rubin (by non-public email)?

2) And the design rules of Actual TSMC for 180nm various with Design rules of MOSIS TSMC 180nm process right?

It looks like there are MOSIS TSMC design rules that are compatible with actual TSMC as Leandro has already pointed out (Table 2b and 2c in https://www.mosis.com/files/scmos/scmos.pdf).

However, it seems that there can be differences between them. You should see at

https://www.mosis.com/pages/design/rules

that it says "Use vendor specific rules for fine-tuned layout." If you are interested in different vendors, there is a list at:

https://www.mosis.com/products/fab-processes

3) So what is the minimum technology size that i can use to design layout in electric without DRC errors satisfying Design rules.?

I don't think that there is a limit on the minimum technology size that you can use as long as it is greater than zero and you have set the appropriate design rules for your minimum technology.

You might also have a look at section "1.5.3 Layout Design Rules" on page 24 in the Introduction chapter of CMOS VLSI Design (4th Edition) by Neil H. E. Weste and David Money Harris [ Click Look Inside and the then Introduction link at http://pages.hmc.edu/harris/cmosvlsi/4e/ ]. According to what it says, it looks like you should be able to change just lambda without having to change the MOSIS (mocmos) design rules in Electric for 180 nm process technology. However, for process technologies below 180 nm, it indicates that the design rules would have to be altered as they become complex and process specific.

Is it lamda=100nm for TSMC 180nm process?

I believe the TSMC 180 nm process is limited typically to a minimum technology size of lambda = (180 nm process)/2 = 90 nm.


4) So can i say that we can do 180nm technology with MOSIS submicron design rules with lamda=100nm and 90nm ?.

Based on Table 2b and 2c in scmos.pdf, I would say the answer is yes. However, it seems better to describe the design rules at lambda = 90 nm as "deep submicron" like in Table 2c as the term "submicron" appears to be reserved for the processes in Table 2b.

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