dave wrote: > If anyone is really desperate I think I still have some KPR (Kodak > photoresist) around. IIRC ... vacuum pull down the photomask over the > substrate (board) expose with UV. Develop with toluene. Etch. > > Since I'm a packrat (I'm obviously relate to Neotoma cinerea ) ;-) the > KPR is tucked away someplace. It may have auto-polemerized. > Arrgh! Horrible stuff, horrible chemistry, terrible exposure control and repeatability. Use dry film resist, all aqueous processing with mild chemicals. Vastly better exposure control (I've used both, as you might tell from the above) visible results after development so you know if the resist expose/develop step went well before you try etching. Think and Tinker sells it in small quantities, I believe.
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