Hello Steven and Meep Users, I am attempting to simulate enhancement in the electric field intensity within a metal/dielectric/metal cavity. In my physical system light originates completely from the dielectric, therefore I use a distribution of point sources within the dielectric. Finally, in order to remove intensity due to sources I take the difference of the field in the metal/dielectric/metal cavity from the field in a pure dielectric. My problem is that I find the enhancement depends on the number of point sources (and therefore the amplitude) and their location within the dielectric. My question is: in order to remove the source dependence of the field enhancement, should I attempt to use a single point source, take the difference between the field in the plasmonic cavity and pure dielectric, and divide the result (matrix element by matrix element) by the field in the pure dielectric? Is there a better approach? Thanks in advance for any tips.
-Best, Carlos Aspetti
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