Re: [PATCH v2 2/2] staging: iio: ad7780: generates pattern_mask from PAT bits

2018-11-11 Thread Jonathan Cameron
On Fri, 9 Nov 2018 20:18:58 -0200 Giuliano Augusto Faulin Belinassi wrote: > Hi > > >While I agree that it looks nicer to indent all these to the same level, > >you also need to think about the fact that the kernel git repo is already > >pretty big as-is, so it's a good idea if a patch adds as m

Re: [PATCH v2 2/2] staging: iio: ad7780: generates pattern_mask from PAT bits

2018-11-09 Thread Giuliano Augusto Faulin Belinassi
Hi >While I agree that it looks nicer to indent all these to the same level, >you also need to think about the fact that the kernel git repo is already >pretty big as-is, so it's a good idea if a patch adds as much code/semantic >value [as possible] with as little change [as possible] and with as

Re: [PATCH v2 2/2] staging: iio: ad7780: generates pattern_mask from PAT bits

2018-11-08 Thread Ardelean, Alexandru
On Thu, 2018-11-08 at 11:03 -0200, Giuliano Belinassi wrote: > Previously, all pattern_masks and patterns in the chip_info table were > hardcoded. Now they are generated using the PAT macros, as described in > the datasheets. One comment about indentation/whitespace. Rest looks good. Alex > >

[PATCH v2 2/2] staging: iio: ad7780: generates pattern_mask from PAT bits

2018-11-08 Thread Giuliano Belinassi
Previously, all pattern_masks and patterns in the chip_info table were hardcoded. Now they are generated using the PAT macros, as described in the datasheets. Signed-off-by: Giuliano Belinassi --- Changes in v2: - Added the PATTERN and PATTERN_MASK macros - Update BIT macros align