Best I can recall:
Nope. An entity is merely an alternate way of specifying a character. The XML 
parser is supposed to replace the entity with the corresponding code point 
before the value is evaluated against the schema.

> On Dec 12, 2014, at 8:49 AM, Greg Hellings <greg.helli...@gmail.com> wrote:
> 
> It should be possible to escape any such characters with an XML entity, no?
> 
> On Dec 12, 2014 7:44 AM, "DM Smith" <dmsm...@crosswire.org 
> <mailto:dmsm...@crosswire.org>> wrote:
> 
> > On Dec 12, 2014, at 8:26 AM, Peter Von Kaehne <ref...@gmx.net 
> > <mailto:ref...@gmx.net>> wrote:
> >
> > Gesendet: Freitag, 12. Dezember 2014 um 13:16 Uhr
> > Von: "Troy A. Griffitts" <scr...@crosswire.org 
> > <mailto:scr...@crosswire.org>>
> >
> >> Not sure, but I thought we used optional prefixes to specify the kind of 
> >> gloss if there are multiple, e.g., > gloss="en_US:18&nbsp;wheeler 
> >> en_UK:articulated&nbsp;lorry"
> >
> > Should there be an option to escape colons?
> 
> IMHO:
> Yes.
> 
> The definition of gloss in the schema is xs:string, not osisGenRegex.
> The former places no semantic on the content an allows for an empty string.
> 
> If gloss should have a semantic, then it should be changed in the OSIS spec.
> 
> The latter is used by lemma and morph and is specified as:
> ((((\p{L}|\p{N}|_)+)(\.(\p{L}|\p{N}|_))*:)?([^:\s])+)
> which basically is work:value.
> If I read this right it does not allow for :  to be escaped. I know we allow 
> lemma=“x:a y:b” but I don’t see that this allows for the pattern to be 
> repeated, separated by spaces.
> 
> The pattern would need to change ([^:\s])+ to (\\:|[^:\s])+  [ not tested ]
> 
> In His Service,
>         DM
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