Dear Nicola,

I share with you the perplexity about the unusual values for the cutoffs, that's why I wished to understand the origin of it and whether it could be improved or fixed (other than just setting such cutoff and keep going). About checking the pseudo versus the total energy, it might be not so relevant but indeed it is a necessary condition.

In my tests I just run scf calculations with different cutoffs/k-mesh with fixed geometry and extract the total energy (i.e. fixing the precision rather than the accuracy, in the language of Science, 351, 2016, paper). I consider the minimal cutoff the one at which the total energy is within ~ 1mRy from the value of the calculation with the highest cutoff. I can also extract the corresponding total force or stress.

Finally, I definitely agree with you about the "hardness" of pseudo-generation; the results I was reporting are from the checks on the SSSP pseudos (or pslibrary v 0.1<->1.0.0 ones, in general, which yield similar numbers), the only difference lies in taking into account a system more complex that a single atom. In my particular case, I did consider a small patch of graphene-like C,N compound.

Hence I wondered if there was any modification, given the possible differences between the isolated atom and the small patch, to improve the effectiveness of the pseudo (hence, not just hardness, but a proper size of the dual). My first guess was to check the transferability of the pseudo, which maybe was not enough to cover the electronic configuration of the patch. That's what I could not test with ld1.x

Bests,

--
Aldo Ugolotti, Ph.D.

Post-doc fellow
Materials Science Dept. U5,
Università degli Studi di Milano-Bicocca
via Cozzi 55,
20125 Milano (MI)
Italy
e-mail: [email protected]


On 02/04/20 19:00, Nicola Marzari wrote:



On 02/04/2020 18:16, Aldo Ugolotti wrote:
Dear Nicola,

thanks for your reply. I mentioned the energy criteria for convergence as the simplest one to verify.

Dear Aldo,

indeed, it is simple, but also it is not relevant, so there aren't many conclusions that can be drawn from it.

Regarding the pseudos you mentioned (PBE), those available at the materialscloud portal, I have checked them either in the atomic case and for a simple system of interest. In the latter case, I found that the required minimal cutoffs are ~90/225 Ry while in the former case the results of ld1.x (for Hamiltonian evaluation with Bessel functions) are consistent with the numbers you reported.

For the SSSP, the cutoffs are based on convergence of phonon frequencies, stress, and formation energies; the systems considered are the elemental solids of Cottonier (we have protocols also for more complex systems). Of course, you might need tighter cutoffs for your goals, or you could afford looser ones. Not sure what your tests are, but a cutoff of 90/225 (i.e. a dual of 2.5) is quite unusual - the charge density would need a dual of 4 for a norm-conserving pseudopotential (admittedly, once could use a bit less) but the ones you are testing are not even norm-conserving, but PAW or ultrasoft, where duals in the range 6-16 are common (for C and N, you might get away with something like 6).

Generating pseudopotentials that are softer while remaining accurate is exceedingly difficult, as you can see from the literature.


If I understood correctly the works you referred to, the delta parameter seems much more large-scale (i.e. code to code) than the scope I am working in, as I am not validating a pseudo generation procedure, (which I am assuming to be already accurate, given the source) but rather I am trying to understand the system-dependency of the behavior of the pseudo. However, I am mistaken, I will be glad to check those papers again and run some tests.

The delta parameter checks if the equation of state of an elemental solid described with a pseudopotential is similar to the all electron calculations of the same solid.

            nic


--
Aldo Ugolotti, Ph.D.

Post-doc fellow
Materials Science Dept. U5,
Università degli Studi di Milano-Bicocca
via Cozzi 55,
20125 Milano (MI)
Italy
e-mail: [email protected]

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