NiO is the answer


The use of hydrogen reduction of oxide creates abundant lattice defects in
NiO or any other oxide when exposed to hot hydrogen over an extended
timeframe.



Hydrogen based NiO reduction will create large numbers of O vacancies in the
surface of the NiO crystal.



The presence of O vacancies leads to an increase in the adsorption energy of
H2 and substantially lowers the energy barrier associated with the cleavage
of the H-H bond. At the same time, adsorbed hydrogen can induce the
migration of O vacancies from the bulk to the surface of the oxide.



These large numbers of O vacancies provide the nuclear active sites where
large numbers of hydrogen atoms are drawn and packed in. The oxygen within
the bulk of the NiO particle will strongly attract H into the particle.



This hydrogen reduction process of NiO will produce a nickel metal foam like
structure on the surface of the NiO particle heavily packed with H.





See the following



http://www.google.com/url?sa=t&source=web&cd=11&ved=0CB0QFjAAOAo&url=https%3A%2F%2Fpubweb.bnl.gov%2Fpeople%2Ffrenkel%2FNIO%2Fjacs.pdf&ei=sgyrTauKHOn20gHnhcH5CA&usg=AFQjCNFQpN-Hy2kt7yqpK3zilbCxaDGbRA&sig2=IM5WSgAI5S3nc-6x3952CA





Abstract:



Reduction of an oxide in hydrogen is a method frequently employed in the
preparation of active catalysts and electronic devices. Synchrotron-based
time-resolved X-ray diffraction (XRD), X-ray absorption fine structure
(NEXAFS/EXAFS), photoemission, and first-principles density-functional (DF)
slab calculations were used to study the reaction of H2 with nickel oxide.
In experiments with a NiO(100) crystal and NiO powders, oxide reduction is
observed at  atmospheric pressures and elevated temperatures (250-350 °C),
but only after an induction period. The results of in situ time-resolved XRD
and NEXAFS/EXAFS show a direct NiO to Ni transformation without accumulation
of any intermediate phase. During the induction period, surface defect sites
are created that provide a high efficiency for the dissociation of H2. A
perfect NiO(100)  surface, the most common face of nickel oxide, exhibits a
negligible reactivity toward H2. The presence of O vacancies leads to an
increase in the adsorption energy of H2 and substantially lowers the energy
barrier associated with the cleavage of the H-H bond. At the same time,
adsorbed hydrogen can induce the migration of O vacancies from the bulk to
the surface of the oxide. A correlation is observed between the
concentration of vacancies in the NiO lattice and the rate of oxide
reduction. These results illustrate the complex role played by O vacancies
in the mechanism for reduction of an oxide. The kinetic models frequently
used to explain the existence of an induction time during the reduction
process can be important, but a more relevant aspect is the initial
production of active sites for the rapid dissociation of H2.

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