Nano-defects are very tough. This toughness and associated resistance to melting and stress is conducive to the production of high pressure inside defect.
The smaller the dimensions of the lattice surface defect, the greater is the multiplier on the hardness and the resistance to stress compared to the bulk material. These multiplier factors can range from 3 to 10 based on the properties of the bulk material. Multilayer sites that penetrate down through many lattice layers are more resilient than surface defects. There toughness is proportional to the detailed topology and therefore not generally determined. There is a certain minimum size which one reached reduces the hardness of the nano-defect site. This size is on the order of less than 10 nanometers. On Thu, May 19, 2011 at 11:01 PM, <mix...@bigpond.com> wrote: > In reply to Axil Axil's message of Thu, 19 May 2011 18:13:48 -0400: > Hi, > [snip] > >These atomic CN imperfections induce bond contraction and the associated > >bond-strength gain deepens the potential well of the trapping in the > surface > >skin. > > By how much? > > >This CN reduction also produces an increase of charge density, energy, > >and mass of the enclosed hydrogen contained in the relaxed surface skin > >imperfection. > > How much density increase, and do you still think that would also happen > with > H-? > > Regards, > > Robin van Spaandonk > > http://rvanspaa.freehostia.com/project.html > >
