Dear All,

I have an issue with 2 different parts (not related to each other). They are as 
follows.


  1.  I am having a hard time in getting a hcp structure of HfO0.7 (or Hf605 
which is close to 0.7). Therefore, what I have done is that I have downloaded 
the hcp structure of HfPo and substituted the Po with Oxygen.

Now, I want to do the structural and volumetric relaxation so that I have the 
stable relaxed structure of HfO0.7. I did read the guidebook but I need 
guidance on what should be the correct order of optimisation (I am lost as I 
can’t understand from which optimisation I should start).

  2.  In the eloss programme, which part of the function does the eloss, 
epsilon and sigmak correspond to ? I guess eloss = energy loss function, 
epsilon = real part of the dielectric function , sigmaK = imaginary part of the 
dielectric function. Am I right?

Looking forward to your kind guidance.

Thank you.

With warm regards,
Pranjal





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