On Tue, 19 May 2026 20:46:59 GMT, Vladimir Ivanov <[email protected]> wrote:
>> Xiaohong Gong has updated the pull request with a new target base due to a >> merge or a rebase. The incremental webrev excludes the unrelated changes >> brought in by the merge/rebase. The pull request contains four additional >> commits since the last revision: >> >> - Do not clone maskAll if two inputs of AndVMask are both mask-not pattern >> - Merge branch 'jdk:master' into JDK-8378737 >> - Add comment >> - 8378737: AArch64: Fix SVE match rule issues for VectorMask.andNot() > > Sorry for the delay. Testing results (hs-tier1 - hs-tier6) are clean. Thanks so much for your testing and review @iwanowww ! Hi @theRealAph, would you mind taking another look at the latest commit? Thanks in advance! ------------- PR Comment: https://git.openjdk.org/jdk/pull/30013#issuecomment-4493751987
