On Friday 03 July 2015 17:38:13 Bertho Stultiens wrote:
> Hi all,
>
> While porting the Hershey fonts for engraving it occurred to me that
> they are very heavy in pen-up/down movements because many strokes are
> partials. There is plenty of room for optimization, reducing the rapid
> moves by about 30%, but that means that engraving is not done in a
> consistent direction anymore.
>
> To illustrate what I mean, consider the letter V:
> 1) single stroke movement:
>  - rapid move to left top
>  - pen down
>  - move to middle bottom
>  - move to right top
>  - pen up
>
> 2) double stroke movement:
>  - rapid move to left top
>  - pen down
>  - move to middle bottom
>  - pen up
>  - rapid move to right top
>  - pen down
>  - move to middle bottom
>  - pen up
>
> The first is faster (quite a bit) because you prevent Z movements and
> extra travel. However, the directional change of the mill may be
> visible in the stroke. On the other hand, the mill may not properly
> revert to the middle bottom in the second case either.
>
> What is the experience of the people here? What would be preferable? A
> quick (case 1) path or a directionally consistent path (case 2)?

If you see more than a nearly invisible artifact using the first method, 
then it is time to tweak the backlash. Etching a PCB is also a pretty 
good test.  However, I am not privy to whether or not the alpha blending 
includes the backlash movements.
Cheers, Gene Heskett
-- 
"There are four boxes to be used in defense of liberty:
 soap, ballot, jury, and ammo. Please use in that order."
-Ed Howdershelt (Author)
Genes Web page <http://geneslinuxbox.net:6309/gene>

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