After having used otbcli_FineRegistration quite a lot, I have come to the conclusion that the Metric window defined by Metric Radius X and Metric Radius Y must be quite large, otherwise the calculated offset values are prone to be too local (it is easy to find sporious high correlations at positions that are not geometrically correct if the window is over a homogeneous area) and unrealistically variable.
The problem is that the program is very slow for large Metric windows. Neverthless, there is no reason why the metric window should be positioned at every pixel. FineRegistration could have "jumpX", jumpY" arguments so that the metric is calculated every jumpX and jumpY pixels, which would speed up computation a lot. For example -erx 5 -ery 5 -mrx 121 -mry 121 -jumpx 31 -jumpy 31 would be enough The final X and Y offset "images" would then be just interpolated. It is more important a large mrx and mry than having the values calculated at every pixel. This should not be hard to implement for someone knowing well the code. I would be willing to intensively test the new implementation. Agus -- -- Check the OTB FAQ at http://www.orfeo-toolbox.org/FAQ.html You received this message because you are subscribed to the Google Groups "otb-users" group. To post to this group, send email to [email protected] To unsubscribe from this group, send email to [email protected] For more options, visit this group at http://groups.google.com/group/otb-users?hl=en --- You received this message because you are subscribed to the Google Groups "otb-users" group. To unsubscribe from this group and stop receiving emails from it, send an email to [email protected]. For more options, visit https://groups.google.com/d/optout.
