Dear Colleagues,
We would like to invite you to participate to the *symposium H: "Current
Trends in Optical and X-ray Metrology of Advanced Materials and Devices
II"* in 2007 E-MRS Fall Meeting, 17th-21st of September 2007 Warsaw, Poland
Abstract deadline is May 14th, 2007
For any additional information see Conference web-site:
http://www.e-mrs.org/meetings/fall2007/
We kindly ask you to forward this message to your contact group.
This E-MRS symposium is aimed to:
- give an overview of the current status of optical and x-ray
metrology for materials characterization and quality assurance of thin
films, layer-structured materials, and one-dimensional nanomaterials,
with a particular emphasis on state-of-the-art metrology
- promote and encourage the interaction between academic and
industrial research (instrument manufacture, IC and optoelectronics
industry and materials suppliers) to address scientific and
technological challenges associated with the improvement of standard
analytical methods and qualification of newer techniques.
First we would like to highlight the trends and advances in the
techniques of optical and X-ray metrology for thin film materials,
nanowires and nanotubes and secondly, we will address the application of
such techniques to the study of thin-layered, wide band gap nitrides and
functional oxide films (high-k dielectrics, ferroelectrics, ZnO and
novel p-type transparent conductive oxides), as well as nanotubes and
nanowires based on these materials.
As manufacturing processes become more complicated, it is imperative to
employ in-situ metrology; this is particularly true in the
microelectronics and micro-systems industry, such as compound
semiconductor electronics, photonics, MEMS and sensors.
Among the various X-ray-based methods, standard X-ray diffractometry,
X-ray reflectivity and diffuse scattering are acquiring an increasing
relevance for characterization of materials and devices in academic and
industrial laboratories, since these techniques are rapid, high
resolution, non-destructive and non-contacting. In addition, the
availability of high brilliance X-ray Synchrotron sources and the recent
development of new X-ray scattering techniques offers new opportunities
for non-destructive characterization of microstructures and the unique
opportunity of characterization of micrometer-sized (or smaller) objects.
The current trends in optical metrology mainly concern spectroscopic
ellipsometry (SE), polarisation and modulation spectroscopy, anisotropic
reflectance and Near Field Optical Microscopy (nanoRaman).
Both optical and X-ray related techniques have gained considerable
interest in the last decade and are currently involved in the
characterization of thin film materials and nanomaterials. In this
symposium, these methods will be discussed with particular attention
paid to their application, as well as their limitations and
complementarities.
On behalf the organisers,
Olivier Durand
THALES Research & Technology France
Route Départementale 128
F-91767 Palaiseau cedex
Phone : +33(0)1 69 41 57 78
Fax: +33(0)1 69 41 57 38
Courriel /e-mail : [EMAIL PROTECTED]
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Daniel Chateigner
Professeur
Co-editor "Journal of Applied Crystallography", www.iucr.org
Editor-in-Chief "Texture, Stress and Microstructure", www.hindawi.com
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address: CRISMAT-ENSICAEN and IUT-Caen,
Université de Caen Basse-Normandie, campus 2
6, Bd. M. Juin 14050 Caen, France
tel: 33 (0)2 31 45 26 11
fax: 33 (0)2 31 95 16 00
[EMAIL PROTECTED]
http://www.ecole.ensicaen.fr/~chateign/danielc/
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A Quantitative Texture Analysis Course:
http://qta.ecole.ensicaen.fr/
An Open Source for Crystallographic Data: the COD
http://sdpd.univ-lemans.fr/cod/
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