Re: [SIESTA-L] Fermi level and k-grid

2007-01-11 Thread Andrei Postnikov
On Wed, 10 Jan 2007, Oleksandr Voznyy wrote:

|  The Fermi level is normally calculated by setting the cumulative occupation
|  number of all bands to the number of valence electrons. 
| 
| As I understand this means that Ef in semiconductor would always be
| at the VBM and not in the middle of the gap?

Alexander -
sorry, it seems that I was wrong. I just checked my old calculation for a
wide-gap dielectric and see that Fermi energy = -6.866874 eV
while the energies bordeing the gap -8.08 and -4.66. One should look
into details of implementation...
Yes in other band structure codes I know the Fermi energy is fixed by the last 
occupied band, i.e. it is set at the valence band top. 
Then if it technically lies higher, this must be due to the energy broadening 
introduced. But apparently in Siesta it is done differently.

| By the way, how the bandstructure is calculated using only several k-points?

The band structure as such (continuous bands) is not calculated,
each k-point enters independently of others and contributes a (smeared)
peak in the density of states. This summary DOS is (roughly speaking)
integrated, and as the number of electrons is achieved, the Fermi level
is set. (The details of implementation might be different).

Best regards,

Andrei

+-- Dr. Andrei Postnikov  Tel. +33-387315873 - mobile +33-666784053 ---+
| Paul Verlaine University - Institute de Physique Electronique et Chimie, |
| Laboratoire de Physique des Milieux Denses, 1 Bd Arago, F-57078 Metz, France |
+-- [EMAIL PROTECTED]  http://www.home.uni-osnabrueck.de/apostnik/ 
--+



Re: [SIESTA-L] Fermi level and k-grid

2007-01-11 Thread Oleksandr Voznyy
The Fermi level is normally calculated by setting the cumulative occupation 
number of all bands to the number of valence electrons. 


As I understand this means that Ef in semiconductor would always be
at the VBM and not in the middle of the gap?

How it could happen that Ef appeared somewhere in the middle of the gap 
in my calculations (see my previous post)?

There are no states in the gap independently on the amount of k-points.

By the way, how the bandstructure is calculated using only several k-points?


In a metal system, metal Etot won't be so stable against
k-mesh as in semiconductor, and would normally require much much more
dense k-mesh. 


Well in my case of partially filled dangling bonds on the surface I end 
up as a metallic system.

Would Methfessel-Paxton smearing help in my case?

Again, does population of the bands affect the band structure and total 
energy or population is a secondary property? - see my example of 
molecule adsorption to dangling bond in previous post.


 It would be such a good investment to add a tetrahedron integration
 in Siesta... And a not very difficult one...

From my experience one needs about 10*10*10 mesh nodes along each 
direction in BZ to get convergence with tetrahedrons.

Does one need that much points for metals?

I don't see the problem of SCF convergence in my bulk GaAs.
I see that Ef(k-points) doesn't converge (up to 50A).

I think that 4000 k-points is more than enough for convergence even for 
metals. But I don't see convergence at all even for more k-points.



Thanks,
Alexander



Re: [SIESTA-L] Fermi level and k-grid

2007-01-10 Thread Andrei Postnikov
On Wed, 10 Jan 2007, Oleksandr Voznyy wrote:

| Hi,
| till recently I though that checking the convergence of total energy vs k-grid
| cutoff is enough.
| However, now I've found that while total energy can be very well converged,
| Fermi level position is not, and requires at least twice denser k-grid (and ~4
| times more time).
| 
| Here is my example for bulk GaAs:

Dear Alexander,

the problem you describe stems from the fact that k-space summation,
done by sampling, is not accurate enough. However, this is technically
no problem for systems with large enough band gap and/or molecules.
On the contrary, for metallic systems, or those where the Fermi level
crosses states in the gap, the convergency of results with k-points
in indeed disappointingly slow (as compared with codes using tetrahedron
integration).
The Fermi level is normally calculated by setting the cumulative occupation 
number of all bands to the number of valence electrons. As I understand 
the situation in Siesta, this cumulative occupation is obtained by integrating 
the Fermi function smeared with ElectronicTemperature, and summed up 
over k-points with their respective weights. That's why increasing
ElectronicTemperature usually suppresses the fluctuations and helps 
the convergency, but somehow deteriorates the resulting energy values.

Considering your example, for pure GaAs (or any semiconductor)
you probably won't care much about the exact value of E-Fermi
because you get the valence and conduction bands right, and total
energy is stable. Etot is more stable
because it is integral property while the calculated E-Fermi
is differential one which shifts back and forth with every single
k-point added. Correspondingly, the DOS is a sum of smeared delta-peaks,
it also wildly changes with adding k-points, and converges extremely
slowly to the DOS found from other band structure code with tetrahedron
integration. In a metal system, metal Etot won't be so stable against
k-mesh as in semiconductor, and would normally require much much more
dense k-mesh. 

It would be such a good investment to add a tetrahedron integration
in Siesta... And a not very difficult one...

Best regards,

Andrei Postnikov

+-- Dr. Andrei Postnikov  Tel. +33-387315873 - mobile +33-666784053 ---+
| Paul Verlaine University - Institute de Physique Electronique et Chimie, |
| Laboratoire de Physique des Milieux Denses, 1 Bd Arago, F-57078 Metz, France |
+-- [EMAIL PROTECTED]  http://www.home.uni-osnabrueck.de/apostnik/ 
--+

On Wed, 10 Jan 2007, Oleksandr Voznyy wrote:

| Hi,
| till recently I though that checking the convergence of total energy vs k-grid
| cutoff is enough.
| However, now I've found that while total energy can be very well converged,
| Fermi level position is not, and requires at least twice denser k-grid (and ~4
| times more time).
| 
| Here is my example for bulk GaAs:
| kgridEf, eV  k-pnts SCFtime  forces   Etot
| cutoff
| 8 -5,3105 32  1   0,00509 -789,50149
| 10-4,9698 --  --  2,19E-4 -789,44567
| 12,2  -4,1639 108 --  0,0052  -789,50521
| 16,287-4,1839 256 1,370,0028  -789,50544
| 20,359-4,7579 500 --  1E-3--
| 26,467-5,1201 11833,139   2E-4-789,5052
| 30,5  -4,9783 1800--  4E-5-789,5054
| 32,575-4,7802 20484,736E-6-789,50545
| 40,7  -4,7676 4000--  1,28E-4 50  -5,1057 16
| 2,07E-4   
| 
| As you can see, Fermi level varies in the range of 0.6 eV!!! (all the bands
| don't shift). The middle of the gap is at -4,75
| 
| My questions are:
| 
| 1. How Fermi level is calculated?
| Is it just filling the available bands with a given amount of electrons (based
| on calculated DOS on a given k-grid) after all calculations are done? What
| smoothing of DOS is used then???
| 
| Ef doesn't converge actually.
| If 1. is true then I can understand it - DOS shape changes quite significantly
| and real convergence would be only when one gets all possible k-points.
| 
| 2. Since the total energy is calculated on the same k-grid, why it doesn't
| show the same behavior? i.e why it is less sensitive than Ef?
| Should one bother at all about Ef during geometry relaxation?
| 
| 3. Does the filling of the bands affect the forces on atoms, and thus
| explicitly affects total energy?
| Imagine such a situation:
| a molecule adsorbs to a dangling bond on a surface only if it is empty or only
| partially filled,
| if I set the Ef 0.5eV higher, I make the dangling bond completely filled  and
| moleculed would not adsorb at all,
| i.e. we end up in a completely different geometry and total energy.
| 
| I will appreciate very much any comments or suggestions.
| 
| Sincerely,
| Alexander.
| 
|