Re: RF Field Uniformity and Antenna location

2002-01-19 Thread John Woodgate
I read in !emc-pstc that Ken Javor ken.ja...@emccompliance.com wrote (in 20020119014135.UEWQ10932.femail35.sdc1.sfba.home.com@[65.11.150.27] ) about 'RF Field Uniformity and Antenna location', on Fri, 18 Jan 2002: I went to the EMC Test Systems website and looked at the 3106 half power beamwidth

Re: RF Field Uniformity and Antenna location

2002-01-19 Thread Ken Javor
is not as much as my gut reaction. I am used to working at 1 meter separations and the directionality of the DRG horn is a greater problem than at three meters. -- From: John Woodgate j...@jmwa.demon.co.uk To: emc-p...@majordomo.ieee.org Subject: Re: RF Field Uniformity and Antenna location Date: Fri

Re: RF Field Uniformity and Antenna location

2002-01-18 Thread John Woodgate
I read in !emc-pstc that Ken Javor ken.ja...@emccompliance.com wrote (in 20020118175519.JJOG20810.femail29.sdc1.sfba.home.com@[65.11.150.27] ) about 'RF Field Uniformity and Antenna location', on Fri, 18 Jan 2002: Assuming it is, I can't imagine using a horn, which is a constant aperture antenna

Re: RF Field Uniformity and Antenna location

2002-01-18 Thread John Woodgate
I read in !emc-pstc that scott@jci.com wrote (in OFF94D1E4A.FD295DB 3-on85256b45.00491...@na.jci.com) about 'RF Field Uniformity and Antenna location', on Fri, 18 Jan 2002: 4. Our experience has been that position 3, is generally lower in field strength when compared to other points

Re: RF Field Uniformity and Antenna location

2002-01-18 Thread Ken Javor
absorber on the floor between antenna and quiet zone. -- From: scott@jci.com To: emc-p...@majordomo.ieee.org Cc: craig.har...@jci.com, james.e.te...@jci.com Subject: RF Field Uniformity and Antenna location Date: Fri, Jan 18, 2002, 10:13 AM To All, We are working toward adding

RF Field Uniformity and Antenna location

2002-01-18 Thread Scott . Mee
To All, We are working toward adding capability to perform Radiated Immunity Free Field Testing (Substitution Method), which is very similar to the IEC 61000-4-3 method. The main differences are the following: 1. We have a 15 position target area for uniformity instead of 16 2. Uniformity