Hi Russ - Yes, that may be true, but Mizuno did not talk about sputtering
during the final deposition.  Should we presume there was a bias and a
deuterium plasma?  I hate missing details.

On Mon, Sep 4, 2017 at 10:16 AM, Russ George <russ.geo...@gmail.com> wrote:

> Bob,
> One can sputter the daylight with Pd in a simple D2 plasma under very
> simple conditions!
> *From:* Bob Higgins [mailto:rj.bob.higg...@gmail.com]
> *Sent:* Monday, September 4, 2017 11:42 AM
> *To:* vortex-l@eskimo.com
> *Subject:* [Vo]:Mizuno latest
> Jed,  can I make a request?  Acknowledging your fluency in Japanese and
> relationship with Mizuno ...
> In Mizuno's paper, he describes the deposition the preparation of the Ni
> and the Pd with a good deal of text, but in the final part of the
> preparation (page 8, figure 10) he describes heating the ceramic heater
> wrapped in Pd wire to 700-800°C for 10-20 hours to deposit Pd on the Ni
> surface.  This may be the most important part of the process, yet he only
> spent 1 small paragraph describing the deposition.
> The melting point of Pd is 1550°C and the boiling point of Pd is 2960°C.
> Clearly, at the specified temperature of the ceramic heater, the vapor
> pressure of the Pd is very, very low.  So, without plasma, it is hard to
> understand how any Pd is deposited at all.  Mizuno only describes D2 as
> being in the chamber - there is no Ar that is normally used in sputtering
> (energetic Ar ions are used in sputtering to have a better probability of
> knocking off atoms of the metal due to the high mass of Ar).  Mizuno
> doesn't describe a DC plasma condition that would have been used for
> striking a glow near the ceramic heater with Pd wire for deposition.
> *Can you ask Mizuno if he can provide an explanation of the mechanism of
> Pd deposition used in conjunction with the ceramic heater wound with the Pd
> wire?  Was it an evaporation process, sputtering, or ion plating
> technique?  Was a plasma active during the Pd deposition?  Was it a
> deuterium plasma?  Was there a DC voltage applied between the heated Pd
> wire and the cathode?*
> Also, Mizuno shows SEM photos of the Ni mesh cathode surface before and
> after the treatment.  The after photo shows micron scale bulbous growth
> that I surmise from his deposition method cannot be all Pd.  It appears
> that the surface morphology of the Ni has been vastly altered, and probably
> has only a small film thickness of Pd on top of that.  His Ni mesh cathode
> has a lot of area, and he only has a small amount of Pd wire on the ceramic
> heater.
> *Can you ask Mizuno what he believes is the thickness of Pd that he has
> deposited by his final deposition process?  I.E. in Figure 32, how thick is
> the Pd film on top of the Ni? *
> Regards - Bob Higgins

Reply via email to