I believe that Mizuno heated the ceramic to 700-800C with Pd ire of small
dimension. The surface temperature of the wire could easily exceed 1400C
From: Russ George <russ.geo...@gmail.com>
Sent: Monday, September 4, 2017 12:16 PM
Subject: RE: [Vo]:Mizuno latest
One can sputter the daylight with Pd in a simple D2 plasma under very simple
From: Bob Higgins [mailto:rj.bob.higg...@gmail.com]
Sent: Monday, September 4, 2017 11:42 AM
Subject: [Vo]:Mizuno latest
Jed, can I make a request? Acknowledging your fluency in Japanese and
relationship with Mizuno ...
In Mizuno's paper, he describes the deposition the preparation of the Ni and
the Pd with a good deal of text, but in the final part of the preparation (page
8, figure 10) he describes heating the ceramic heater wrapped in Pd wire to
700-800°C for 10-20 hours to deposit Pd on the Ni surface. This may be the
most important part of the process, yet he only spent 1 small paragraph
describing the deposition.
The melting point of Pd is 1550°C and the boiling point of Pd is 2960°C.
Clearly, at the specified temperature of the ceramic heater, the vapor pressure
of the Pd is very, very low. So, without plasma, it is hard to understand how
any Pd is deposited at all. Mizuno only describes D2 as being in the chamber -
there is no Ar that is normally used in sputtering (energetic Ar ions are used
in sputtering to have a better probability of knocking off atoms of the metal
due to the high mass of Ar). Mizuno doesn't describe a DC plasma condition
that would have been used for striking a glow near the ceramic heater with Pd
wire for deposition.
Can you ask Mizuno if he can provide an explanation of the mechanism of Pd
deposition used in conjunction with the ceramic heater wound with the Pd wire?
Was it an evaporation process, sputtering, or ion plating technique? Was a
plasma active during the Pd deposition? Was it a deuterium plasma? Was there
a DC voltage applied between the heated Pd wire and the cathode?
Also, Mizuno shows SEM photos of the Ni mesh cathode surface before and after
the treatment. The after photo shows micron scale bulbous growth that I
surmise from his deposition method cannot be all Pd. It appears that the
surface morphology of the Ni has been vastly altered, and probably has only a
small film thickness of Pd on top of that. His Ni mesh cathode has a lot of
area, and he only has a small amount of Pd wire on the ceramic heater.
Can you ask Mizuno what he believes is the thickness of Pd that he has
deposited by his final deposition process? I.E. in Figure 32, how thick is the
Pd film on top of the Ni?
Regards - Bob Higgins