Mark--


As Jones said a week or so ago about SPP, we are again meeting in Alice's 
rabbit hole.  

I thought engineering a system might work better than relying on chance to form 
the topology for LENR.  My blog 
>>Saturday, March 01, 2014 10:10 AM<< suggests a manufacturing idea not unlike 
>>yours.  I think we do have technology--it may be what Rossi is using. 

Check out the whole thread-- Re: [Vo]:"Christopher H. Cooper"-- on March 01 
2014 for issues related to topography , cracks etc.  Electronic chip making 
technology may also have some use. 

Such control of isolating LENR locations from the structural/thermal conduction 
part of the reactor would be desirable engineering feature for longer reactor 
life.

Bob

  ----- Original Message ----- 
  From: Mark Jurich 
  To: [email protected] 
  Sent: Sunday, March 09, 2014 4:20 PM
  Subject: Re: Replications. Formerly [Vo]:LENR a gateway into the theory of 
everything.


       Steven wrote:

        | Do we currently possess appropriate technology that could, for 
example, allow us to cut grooves
        | and valleys in the target surface material on an appropriate 
nano-scale? I realize nano-scale means
        | working with structures as small as at the atomic scale.
  FYI (pardon my interjecting):
  You may be interested in looking up, “Nanoimprint Lithography”:
  http://en.wikipedia.org/wiki/Nanoimprint_lithography
  Photolithography (using Light/Photons) has severe limitations when reaching 
the nanoscale.  E-Beam
  Lithography has High Resolution but very low Throughput, not to mention cost. 
 Typically, a “master”
  would be made using e-Beam and transferred to an appropriate material for 
nanoimprinting...
  ... Combining Nanoimprint Lithography with Ion Etching/Milling (and perhaps 
Sputtering), etc., could
  allow one to achieve the desired Nanoscale Structures.  Whether Nanoscale 
Surface Structures are
  needed is another question that needs addressing, but I believe 
Nanoimprinting (although not as
  cheap as we’d all like, right now!) would be a good way to proceed.
  ... One may also get by with simple nanoindentation if large 
patterning/replication isn’t necessary.
  Verification/Testing could be done by Atomic Force Microscopy (AFM) and 
possibly Contact AFM
  (c-AFM).
  - Mark Jurich
   

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